多门晶体管是经典金属氧化物半导体场效应晶体管的未来
Isabelle Ferain1, Cynthia A Colinge, Jean-Pierre Colinge
1Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland.
Nature
|November 19, 2011
概括
微型晶体管,或金属氧化物半导体场效应晶体管 (MOSFETs),正在接近物理极限. 新的多门晶体管设计为微电子芯片性能的持续进步提供了途径.
科学领域:
- 固态物理 固态物理
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
背景情况:
- 40多年来,晶体管的指数级扩展推动了微电子芯片的发展.
- 缩小金属氧化物半导体场效应晶体管 (MOSFET) 已使晶体管密度增加.
- 目前的MOSFET尺寸接近电特性降低的极限,阻碍了进一步的扩展.
研究的目的:
- 为了解决传统的 MOSFET 扩展的局限性.
- 介绍和突出显示多门晶体管的潜力.
- 确保在未来十年内持续提高计算机性能.
主要方法:
- 对历史晶体管缩放趋势的审查.
- 在缩放的MOSFET中分析电气特性降解.
- 介绍多门晶体管几何作为一种新的解决方案.
主要成果:
- 指数式晶体管收缩正在接近基本的物理限制.
- 电气特性退化是当前MOSFET的一个重大挑战.
- 多门晶体管架构成为平面MOSFET的可行继承者.
结论:
- 由于物理限制,指数式MOSFET缩放的时代即将结束.
- 多门晶体管代表了一代能够克服这些局限性的新一代设备.
- 这种新的几何结构对于未来的计算机性能增强至关重要.
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