在高流动性n型低带隙共聚物中聚合,对半晶体形态学有影响
Robert Steyrleuthner1, Marcel Schubert, Ian Howard
1Institute of Physics and Astronomy, University of Potsdam, D-14476 Potsdam, Germany.
Journal of the American Chemical Society
|September 11, 2012
概括
聚合在P(NDI2OD-T2) 聚合物薄膜中是一个两步过程,由聚合物链卷轴驱动. 这种聚合显著影响薄膜特性,导致聚合物含量高,并抑制无形结构.
科学领域:
- 材料科学 材料科学 材料科学
- 聚合物化学 聚合物化学
- 光物理学的光学物理学
背景情况:
- P(NDI2OD-T2) 是一种高流动性,空气稳定的n型供体/接受体聚合物.
- 了解其聚合行为对于优化有机电子设备至关重要.
研究的目的:
- 研究溶液和薄膜中的P(NDI2OD-T2) 的光物理特性和聚合机制.
- 为了将聚合与聚合物链形状和薄膜形态相关联.
主要方法:
- 静态紫外线和光发光 (PL) 光谱学.
- 量子化学计算 量子化学计算
- 核磁共振 (NMR) 光谱学.核磁共振 (NMR) 光谱学.
- 时间依赖的PL测量.
- 分析超离心. 分析超离心.
主要成果:
- 截然不同的光谱特征表明聚合在P(NDI2OD-T2) 溶液中.
- 聚合是一种两步过程,涉及不同类型的聚合物.
- 核磁共振和超离心验证了通过聚合物链卷轴的聚合.
- 薄膜形成主要是由链条崩,导致约45%的聚合物含量.
- 无形和无序的薄膜形成被抑制.
结论:
- 在P(NDI2OD-T2) 中的聚合是受聚合物链形状影响的内在性质.
- 两步聚合过程和链圈是薄膜形态学的关键因素.
- 电影中的高聚合物含量会影响其电子特性和混乱.
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