半导体的激光冷却 40 凯尔文
Jun Zhang1, Dehui Li, Renjie Chen
1Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 637371, Singapore.
Nature
|January 25, 2013
概括
研究人员在半导体材料硫化纳米带中实现了净激光冷却. 这一突破证明了半导体的光学制冷,与以前的方法相比,这是一个显著的进步.
科学领域:
- 固态物理 固态物理
- 材料科学是一种材料科学.
- 量子光学就是一个量子光学.
背景情况:
- 激光冷却或光学制冷利用反斯托克斯辐射来冷却物质.
- 以前的激光冷却成功主要在稀土杂材料中,在半导体方面取得的成功有限.
- 带有激发共振的半导体为激光冷却提供了一个有前途的替代方案.
研究的目的:
- 在半导体材料中实现净激光冷却.
- 探索II-VI组半导体在光学制冷中的潜力.
- 研究半导体纳米结构中激光冷却背后的机制.
主要方法:
- 使用硫化 (CdS) 纳米带进行激光冷却实验.
- 使用特定激光波长 (514 nm 和 532 nm) 的光学辐射.
- 在光学送下测量温度变化和冷却效率.
主要成果:
- 在CdS纳米带中,从290凯尔文开始,达到约40凯尔文的净冷却.
- 证明了约1.3%的冷却效率和180微瓦的514nm的冷却功率.
- 观察到净冷却约15凯尔文在100凯尔文与532纳米抽和2.0%的效率.
结论:
- 净激光冷却在CdS纳米带等II-VI组半导体中是可行的.
- 激电子和纵向光学声子 (LOP) 之间的强合是这种冷却效应的关键.
- 这项工作为基于半导体的光学制冷技术铺平了道路.
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