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Fabrication and Optimization of Type II Silicon Clathrate Films
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在1大气压和高压下的一氧化:晶体或无形?

Khalid AlKaabi1, Dasari L V K Prasad, Peter Kroll

  • 1Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States.

Journal of the American Chemical Society
|February 6, 2014
PubMed
概括

这项研究理论上研究了压力下的一氧化 (SiO) 结构. 它揭示了稳定的地面状态和高压相,发现SiO在高压下是金属的,但不成比例.

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