(Ge(111)

Keith T Wong1, Youn-Geun Kim1, Manuel P Soriaga1

  • 1†Division of Chemistry and Chemical Engineering, ‡Joint Center for Artificial Photosynthesis, §Beckman Institute, and ∥Kavli Nanoscience Institute, California Institute of Technology, Pasadena, California 91125, United States.

概括

研究人员创建了一个甲基终结的表面 (CH3-Ge(111)),它在原子上是平的,并且耐氧化. 这种有序的表面,稳定到400°C,显示出先进电子应用的潜力.