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Updated: Apr 7, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
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从分子到表面:在上形成Si-S和Si-Se键的根基机制

Jillian M Buriak1, Md Delwar H Sikder1

  • 1Department of Chemistry, University of Alberta, and the National Institute for Nanotechnology, Edmonton, AB T6G 2G2, Canada.

Journal of the American Chemical Society
|July 11, 2015
PubMed
概括

这项研究探讨了使用有机基化物在室温下制造-硫和-键的表面修饰. 了解这些激进反应可以使更广泛的半导体表面化学应用成为可能.

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