半金属和单层半导体之间的超低接触电阻
Pin-Chun Shen1, Cong Su2,3,4,5, Yuxuan Lin6,7
1Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology (MIT), Cambridge, MA, USA. pcshenc@tsmc.com.
Nature
|May 13, 2021
概括
研究人员使用石实现了二维半导体的超低电阻欧姆接触. 这一突破消除了能源障碍,使得高性能晶体管成为可能,并将摩尔定律扩展到先进的电子产品.
科学领域:
- 材料科学
- 凝聚物质物理学
- 纳米技术
背景情况:
- 先进的电子需要新的通道材料和超低电阻接触,
- 二维 (2D) 半导体为高性能设备提供了潜力,但由于金属诱导间隙状态 (MIGS) 的高接触阻力而受到限制.
研究的目的:
- 开发用于二维半导体晶体管的超低电阻欧姆接触器.
- 在金属半导体接口上克服金属诱导的空隙状态所造成的限制.
主要方法:
- 研究了半金属和半导体单层过渡金属二二烯 (TMD) 之间的欧姆接触形成.
- 使用石来抑制MIGS并诱导TMD的退化状态.
主要成果:
- 在单层MoS2上实现了施特基屏障的零高度.
- 证明了创纪录的低接触电阻为123 Ω·μm和创纪录的高状态电流密度为1135μA/μm.
- 在各种单层半导体上成功形成欧姆接触,包括MoS2,WS2和WSe2.
结论:
- 开发的石接触器在2D半导体的接触阻力上提供了显著的改进,接近量子极限.
- 这项技术使得高性能单层晶体管能够与最先进的3D半导体相匹配.
- 这些发现为进一步缩小设备和扩展摩尔定律铺平了道路.
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