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高密度弹性电路的单立体光学微刻法

Yu-Qing Zheng¹, Yuxin Liu², Donglai Zhong¹

¹Department of Chemical Engineering, Stanford University, Stanford, CA 94305, USA.

Science (New York, N.Y.)

|July 2, 2021

概括

研究人员开发了一种新的光学微光刻技术, 这种方法可以制造复杂的弹性电路,其性能与刚性电子相提并论.

科学领域:

材料科学
电子工程
纳米技术

背景情况:

聚合物电子材料具有先进的柔软和可伸缩电子.
与基于的设备相比,目前的制造方法限制了弹性电路中的设备密度和并行处理.

研究的目的:

开发一种类似皮肤和弹性电路的通用微型/纳米制造方法.
增加设备密度和并行信号记录和处理能力.

主要方法:

采用了一种单立体光学微刻工艺.
在微型弹性电子材料中使用了紫外线触发的序列溶解度调制.

主要成果:

晶体管长度为2微米,其密度为每平方厘米42000个.
弹性电路,包括XOR门和半增子,已成功制造.
该工艺允许在晶圆层制造复杂,高密度和多层弹性电路.

结论:

开发的光学微光刻工艺克服了弹性电路制造的局限性.
这种技术为高性能弹性电路铺平了道路,
在柔软和可伸缩电子产品中实现先进的应用.

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