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水性二的键对深紫外线辐射具有抗性

Jan Thøgersen¹, Adam S Chatterley¹, Tobias Weidner¹

¹Department of Chemistry, Aarhus University, Langelandsgade 140, DK-8000 Aarhus C, Denmark.

Journal of the American Chemical Society

|April 19, 2023

概括

深紫外线辐射导致水性二主要经过脱碳化,使键保持完整. 大多数激发的二回归到它们的基本状态,对紫外线激发有弹性.

科学领域:

摄影化学
生物物理化学
光谱学

背景情况:

二是蛋白质的基本组成部分.
对于包括光医学和材料科学在内的各种应用来说,了解二聚光分离至关重要.
深紫外线 (DUV) 辐射可以诱导生物分子的化学变化.

研究的目的:

在DUV照射下研究水性二的光解离路径.
确定甘甘,氨酸和甘氨酸的主要光动力学和解离产物.
阐明在DUV激发过程中键稳定的机制.

主要方法:

使用五秒光谱探测超快的动态.
密度函数理论 (DFT) 的计算支持实验观察.
在200nm的波长下进行光刺激.

主要成果:

大约10%的激发型二在100皮秒内通过脱碳化解离.
观察到Cα-C键在解离过程中断裂,而不是键.
大多数激发的二回归到它们的基本状态,表明它们具有很高的弹性.

结论:

快速的内部转化和振动放松促进了键的稳定性.
碳酸和胺模式之间的分子内合在能量消散中起作用.
整个能量消散过程发生在 2 个皮秒内,使二部分开放用于进一步的反应.

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