沉积温度对长期残留压力的影响 Au电影的演变
Shujun Zhou1, Wei Wu2, Yilun Yang1
1School of Mechanical Electronic and Information Engineering, China University of Mining and Technology (Beijing), Beijing 100083, China.
Materials (Basel, Switzerland)
|May 27, 2023
概括
增加黄金 (Au) 薄膜的沉积温度增强了微观结构,并减少了初始拉力余应力. 较高的温度提高了长期剩余应力稳定性,这对于薄膜应用至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜技术 薄膜技术
- 表面科学是一门学科.
背景情况:
- 黄金 (Au) 薄膜中的残余应力会影响设备的性能和寿命.
- 控制剩余应力对于微电子和光子学中的应用至关重要.
- 了解Au薄膜的应力演变需要调查沉积参数.
研究的目的:
- 调查沉积温度对AU薄膜长期残余应力演变的影响.
- 为了降低剩余应力水平,同时增加AU电影的剩余应力稳定性.
- 为了将微观结构的变化与不同沉积温度下的残余应力行为相关联.
主要方法:
- 黄金薄膜 (厚度为360纳米) 被沉积在化上,使用不同温度的e-beam蒸发.
- 在沉积的薄膜上进行了微结构分析 (粒径,空隙).
- 在自然放置和80°C的热保持过程中,使用基于曲率的技术监测剩余应力.
主要成果:
- 更高的沉积温度导致更紧的Au薄膜微结构,具有更大的粒度和更少的粒度边界空隙.
- 作为沉积膜的初始拉力残余应力随着沉积温度的增加而降低.
- 在较高温度下沉积的au薄膜在自然放置和热保持的结合下表现出优异的长期残余应力稳定性.
结论:
- 沉积温度是控制Au薄膜残余应力的关键参数.
- 优化沉积温度导致改进的微观结构和增强的余应力稳定性.
- 沉积温度的提高为AU薄膜的应力管理提供了沉积后回火的可行替代方案.
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