提高铁电的耐力Hf0.5Zr0.5O2使用层状结构间层
Meiwen Chen1,2, Shuxian Lv1,2, Boping Wang1,2
1Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China.
Nanomaterials (Basel, Switzerland)
|May 27, 2023
概括
在 hafnium氧化物 (HZO) 薄膜中的新型层状结构显著提高了铁电电容的耐用性,达到10^8周期,并减少了泄漏电流. 这种方法可以提高HZO设备的可靠性,而不需要复杂的处理.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 电气工程 电气工程
背景情况:
- 铁电薄膜,如氧化 (HZO),对于先进的电子设备至关重要.
- 提高基于HZO的电容器的可靠性,特别是耐力和泄漏电流,对于实际应用至关重要.
- 现有的可靠性提升方法往往涉及复杂的材料组成或加工步骤.
研究的目的:
- 为了提高TiN/HZO/TiN电容器的耐久性特性.
- 为了减少HZO薄膜电容器中的泄漏电流.
- 为了研究层状HZO结构对设备可靠性的影响.
主要方法:
- 在HZO薄膜内使用层状结构制造TiN/HZO/TiN电容器.
- 修改HZO沉积比率以创建一个中间层.
- 使用时间依赖介电断裂 (TDDB) 试验评估耐久性特征,泄漏电流和可靠性.
主要成果:
- 层层的HZO结构提高了电容器的耐用性两个数量级 (10^6到10^8周期).
- 在带有层状中间层的电容器中,观察到泄漏电流减少了一级.
- 剩余极化略有下降,但可靠性显著提高.
结论:
- 层状HZO结构是一种有效的策略,可以显著提高铁电容器的耐久性,减少泄漏电流.
- 观察到的可靠性提升归因于抑制氧空位迁移及其不均分布.
- 这种方法提供了一个可行的和简单的方法来提高HZO设备的可靠性,而不需要额外的材料或复杂的过程.
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