氧空缺缺陷密度对TiO2基指数选择器的非线性和短期可塑性的影响
Mun Yin Chee1, Putu Andhita Dananjaya1, Gerard Joseph Lim1
1School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, 637371, Singapore.
Nanotechnology
|May 31, 2023
概括
减少Pt/TiO2/Pt选择器中氧气空缺缺陷,提高了它们的非线性和短期可塑性. 较低的缺陷密度对于提高RRAM交叉条数组的性能至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 设备工程 设备工程
背景情况:
- 电阻随机存储器 (RRAM) 交叉阵列的性能严重依赖于选择器设备的非线性.
- 优化选择器特性是提高读取边缘和设备可靠性的关键.
研究的目的:
- 研究氧空缺缺陷密度与Pt/TiO2/Pt指数选择器的非线性之间的关系.
- 了解喷雾压力如何影响缺陷度和导电机制.
- 评估缺陷密度对这些选择器的短期可塑性的影响.
主要方法:
- 在TiO2沉积过程中通过变化的喷雾压力制造Pt/TiO2/Pt选择器.
- 用于确定设备非线性和导电机制的电气表征 (Schottky与Poole-Frenkel发射对比).
- 对缺陷密度与喷雾压力和设备性能相关性的分析.
主要成果:
- 随着氧空缺缺陷密度的降低,选择器非线性度会增加.
- 喷射压力直接控制氧气空隙度,将导电从Schottky转移到Poole-Frenkel发射.
- 较低的缺陷密度可以提高Pt/TiO2/Pt选择器的短期可塑性.
结论:
- 降低氧空缺缺陷密度对于提高Pt/TiO2/Pt指数选择器的非线性至关重要.
- 控制喷射压力提供了一种调整缺陷度和优化选择器性能的方法.
- 这些发现对于通过改进的选择器设计来推进RRAM交叉条数组架构至关重要.
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