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皮科米尺度的光学干扰仪使用亚齐木陀复杂光谱分析

Jingtao Dong, Tengda Zhang, Yuzhong Zhang

|June 1, 2023

概括

一种新方法增强了光学干扰计 (OVI) 用于皮科米尺度测量. 这种技术准确地测量了均的表面位移和不均的表面变形.

科学领域:

光学计量学在光学计量学
干涉测量是干涉测量的方法.
纳米尺度的测量方法

背景情况:

光学干扰仪 (OVI) 提供高精度测量能力.
现有的解调方法可能会限制OVI的应用范围和准确性.
在各种科学和工程领域,精确测量表面位移和变形至关重要.

研究的目的:

为光学干扰测量提出并验证一种新的干扰图解调制方法.
为了达到皮科米尺度的测量精度.
将OVI的适用性扩展到轴对称的非均表面变形测量.

主要方法:

利用联的p-辐射顺序的拉盖尔-高斯光束来生成类似花的干涉图.
采用带有多环图案传感器的摄像机,以获得亚齐木图强度配置文件.
应用了亚齐图斯复杂光谱分析,从强度配置中检索相位变化.

主要成果:

在干扰图解调节中实现了皮科米尺度的精度.
证明了10nm位移的84pm的测量误差.
显示了0.359nm的测量误差,用于100nm的变形大小.

结论:

拟议的亚齐穆特复杂光谱分析方法使OVI的干扰图解调高精度成为可能.
该方法成功地扩展了OVI测量轴对称非均表面变形的能力.
这一进步增强了OVI在精密计量学中的实用性.

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