相关实验视频
Updated: Jul 28, 2025
07:03
Low-energy Cathodoluminescence for OxyNitride Phosphors
Published on: November 15, 2016
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概括
本研究介绍了一种无蚀刻的方法,用于使用提升处理和脉冲激光沉积来创建结构化衍射格子. 该技术增强了Er-doped材料中的发光,为集成光学应用提供了一个有前途的替代方案.
科学领域:
- 集成光学 集成光学 集成光学
- 材料科学 材料科学 材料科学
- 纳米制造的纳米制造
背景情况:
- 蚀刻是集成光学微结构的标准,但增加了成本,并可能降低设备性能.
- 现有的无蚀刻方法用于衍射格子包括在结构表面上层沉积或在活性层上进行格子沉积.
- 高比例衍射网格最好通过蚀刻制成,但本研究探讨了一个替代方案.
研究的目的:
- 开发一种完全结构化的衍射格的无蚀刻制造技术.
- 为了将升降处理与脉冲激光沉积相结合,用于微结构.
- 为了证明这种方法在Er-doped材料中增强发光效果的有效性.
主要方法:
- 研究的光刻剂量用于提升处理,以达到微米分辨率和控制侧墙角 (50°150°) 在0.5μm层中.
- 制造的Er-doped Y2O3单轴衍射格子,周期为3至8微米.
- 使用脉冲激光沉积与升降处理相结合.
主要成果:
- 在起重处理中实现微米空间分辨率和控制侧墙角度.
- 成功制造了Er-doped Y2O3衍射网格.成功制造了Er-doped Y2O3衍射网格.
- 与非结构化层相比,在1.54μm时观察到的光增强高达×15,与建模预测相匹配.
结论:
- 升降处理与脉冲激光沉积相结合,是一种可行的无蚀刻技术,用于制造微结构.
- 这种方法对实际应用有希望,例如在Er-doped层中增强发光.
- 开发的技术为创建高性能衍射网格提供了蚀刻的替代方案.
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