垂直范德瓦尔斯异质连接二极管包括2D半导体在3Dβ-Ga2O3上
Chloe Leblanc1, Dinusha Herath Mudiyanselage2, Seunguk Song1
1Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, PA 19104, USA. dmj@seas.upenn.edu.
Nanoscale
|June 2, 2023
概括
研究人员通过调整基板方向,二维材料和接触器来优化氧化物 (Ga2O3) 垂直二极管. 最好的设备实现了电力电子的创纪录的整形比率和高开源电流密度.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电子工程 电子工程
背景情况:
- 氧化 (Ga2O3) 是一个有前途的宽带差半导体,用于高功率电子产品.
- 制造高效的Ga2O3 p-n二极管是具有挑战性的,因为p型兴奋剂存在困难.
- 基板方向对Ga2O3设备性能的影响尚不清楚.
研究的目的:
- 在β-Ga2O3上制造和优化2D/3D垂直二极管.
- 为了研究基板平面方向,二维材料选择和金属接触对设备性能的影响.
- 为了实现功率整流器应用的高整流比率和开启电流密度.
主要方法:
- 使用β-Ga2O3基底制造垂直异质连接二极管.
- 基板平面方向的系统变化,2D材料 (例如,WS) 和金属接触 (例如,Ti).
- 使用高温依赖测量,原子力显微镜 (AFM) 和技术计算机辅助设计 (TCAD) 模拟的设备表征.
主要成果:
- 优化的设备使用了 (-201) 基板平面方向,2D WS2和Ti接触.
- 实现了超过10的创纪录的高整形比率.
- 证明了高的启动电流密度,超过10A cm-2.
结论:
- 基板方向显著影响2D/3Dβ-Ga2O3垂直异质连接的性能.
- 优化的设备结构显示了下一代功率整流器应用的巨大潜力.
- 这项工作为设计高性能Ga2O3基于电子设备提供了关键的见解.
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