一个脉冲直流平面磁铁子放电的流体模型
Si Bui Quang Tran1, Fong Yew Leong2, Ramanarayan Hariharaputran2
1Institute of High Performance Computing (IHPC), Agency for Science, Technology and Research (A*STAR), 1 Fusionopolis Way, Connexis, Singapore, 138634, Republic of Singapore. transbq@ihpc.a-star.edu.sg.
Scientific reports
|June 3, 2023
概括
脉冲直流 (DC) 磁铁子喷射模拟显示,脉冲增加了电子密度和温度,但降低了沉积率. 调整脉冲频率和工作周期可以控制等离子体特性和沉积结果.
科学领域:
- 血物理学的等离子体物理学
- 材料科学是一种材料科学.
- 薄膜沉积是一种薄膜沉积.
背景情况:
- 直流 (DC) 平面磁铁子喷射是一种广泛用于薄膜沉积的技术.
- 在DC磁铁子喷射中优化等离子体参数对于控制薄膜特性至关重要.
- 脉冲功率调制提供了一种增强等离子体特性和沉积控制的方法.
研究的目的:
- 为了研究脉冲直流 (DC) 对平面磁铁子放电特性的影响.
- 分析脉冲频率和工作周期对等离子体特性和沉积率的影响.
- 提供适用于调制脉冲功率磁铁子喷射和交流电 (AC) 反应喷射的见解.
主要方法:
- 脉冲直流平面磁力电离子放电的流体模型模拟.
- 解决物种连续性,动量和能量转移方程.
- 在电磁方面与波桑方程和洛伦茨力结合.
- 在阴极上应用非对称的双极电位波形 (50200 kHz,5080%的功率周期).
主要成果:
- 与非脉冲直流磁铁相比,脉冲增加了电子密度和温度.
- 脉冲降低了沉积速度.
- 脉冲频率的增加导致了更高的电子温度,但更低的电子密度和沉积率.
- 增加的工作周期降低了电子温度和密度,但增加了沉积率.
- 时间平均电子密度与频率相反;放电电压与工作周期相反.
结论:
- 脉冲直流磁铁子喷射允许对等离子体参数进行增强控制.
- 优化脉冲频率和工作周期是定制电子特性和沉积率的关键.
- 模拟结果与实验观察结果一致,并与先进的喷雾技术相关.
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