在异形形LaNiO中可控制的电阻切换行为
Yong Zhang1, Shunhua Gao1, Guiming Cao2
1School of Microelectronics, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China.
Nanotechnology
|June 6, 2023
概括
矿氧化物记忆器中的氧气空缺显著影响电阻切换行为. 控制它们在LaNiO3/Nb:SrTiO3设备中的分布可以提高非易失性内存应用的性能和稳定性.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 设备物理 设备物理
背景情况:
- 矿氧化物记忆器对非易失性记忆有希望.
- 氧气空缺是施托基屏障调节和记忆效应的关键.
- 设备的可变性阻碍了当前memristors的稳定性和可重现性.
研究的目的:
- 为了研究氧空位形状对LaNiO3 (LNO) /Nb:SrTiO3 (NSTO) 设备中电阻切换 (RS) 现象的影响.
- 阐明观察到的RS行为背后的物理机制.
- 为改善memristor性能和稳定性提供见解.
主要方法:
- 制造表轴性LNO/NSTO异构结构.
- 氧空位度和分布的系统变化.
- 分析电阻切换行为的电气表征.
- 对传导机制的分析.
主要成果:
- 在LNO膜中的氧空位迁移对于记忆行为至关重要.
- 在LNO薄膜中增加的氧气空隙提高了电阻开/关比 (HRS和LRS).
- 导电机制从热电离子发射转向道辅助的热电离子发射,随着氧气空缺的增加.
- 在LNO/NSTO接口上优化氧气空缺可以实现陷辅助道,提高设备性能.
结论:
- 这项研究清楚地将氧空位配置文件与LNO/NSTO记忆器中的多种RS行为联系起来.
- 氧气空位工程提供了一种可行的策略,以提高基于Schottky结的memristors的性能和稳定性.
- 了解这些关系为未来的设备设计提供了物理洞察力.
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