堆叠的SiGe纳米片p-FET用于3nm以下的逻辑应用
Chun-Lin Chu1, Shu-Han Hsu2,3, Wei-Yuan Chang1
1Taiwan Semiconductor Research Institute, NARL, Hsinchu, Taiwan.
Scientific reports
|June 9, 2023
概括
垂直堆叠的- (SiGe) 纳米板场效应晶体管 (FET) 已成功制造. 这些先进的晶体管表现出色的性能,包括高开/关比和改进的门控制.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 纳米技术纳米技术
背景情况:
- 场效应晶体管 (FET) 是基本的半导体设备.
- 提高门的可控性和设备性能对于先进的电子设备至关重要.
- - (SiGe) 纳米板 (NS) 结构为改善晶体管特性提供了潜力.
研究的目的:
- 为了证明垂直堆叠的SiGe纳米板 (NS) 场效应晶体管 (FET) 的制造.
- 研究使这些先进设备的制造成为可能的关键工艺技术.
- 为了评估制造的SiGe NS FET的电性能和特征.
主要方法:
- 使用低压化学蒸汽沉积用于SiGe/Si多层表.
- 使用四甲基-氧化物 (TMAH) 湿溶液对Si层和SiGe层进行选择性蚀刻.
- 应用原子层沉积 (ALD) 为Y2O3门介电形成.
主要成果:
- 制造的堆叠SiGe NS p-GAAFETs,其门长度为90nm,实现了约5.0 × 10^5.5的ION/IOFF比率.
- 显示了75mV/dec的子值波动,表明高效的门控制.
- 由于高质量的Y2O3门介电器,观察到最小的排水诱导屏障降低 (DIBL).
结论:
- 通过使用先进的工艺技术,成功制造了垂直堆叠的SiGe NS FET.
- 高性能特性,包括出色的开/关比和下值摆动,证实了这些设备的潜力.
- 使用的制造方法和高质量的门介电器显著提高了门的可控性和整体设备性能.
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