在Hf0.5Zr0.5O2基于MoS2的负电容场效应晶体管中通过调节电容匹配来优化子值波动和歇斯底里
Xiaowei Guo1, Fang Wang1, Zexia Ma1
1Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, Tianjin 300384, China.
ACS applied materials & interfaces
|June 20, 2023
概括
研究人员使用氧化氧化 (HZO) 开发了新的负电容场效应晶体管 (NCFET). 这些先进的NCFET显示了超急切换和高开/关电流比率,为节能电子铺平了道路.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米电子学纳米电子学
- 固态物理 固态物理
背景情况:
- 负电容场效应晶体管 (NCFET) 为低功率设备提供了潜力,因为的下值波动.
- 融入门介电材料的铁电材料是实现负电容效应的关键.
研究的目的:
- 为了优化Hf0.5Zr0.5O2 (HZO) 薄膜用于NCFET应用程序.
- 用HZO门介电材料制造和描述基于2D MoS2的NCFET.
- 通过电容匹配,在NCFET中实现降低子值摆动和歇斯底里.
主要方法:
- 通过磁铁喷射和快速热制备的HZO薄膜.
- 铁电性质根据热温度和HZO厚度进行调整.
- 制造具有不同HZO和Al厚度的2DMoS后门NCFET.
主要成果:
- 优化的NCFET实现了最低下值波动为27.9mV/十年.
- 观察到微不足道的歇斯底里 (∼20 mV) 和高的开启/关闭电流比率 (1.58 × 107).
- 检测到排水引起的负面屏障降低和负差电阻效应.
结论:
- 开发的基于HZO的NCFET显示了对节能纳米电子设备的卓越性能.
- 与CMOS制造工艺的兼容性使得这些坡晶体管对2D逻辑和传感器具有吸引力.
- 对电容匹配的进一步研究对于推进NCFET技术至关重要.
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