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Updated: Jul 25, 2025

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NiO/CeO2@NF异构的接口工程,以促进5-基甲基黄的电氧化

Xiu He1, ZhenZhen Mo2, Huiling Liu1

  • 1Tianjin Key Laboratory of Advanced Functional Porous Materials and Center for Electron Microscopy, Institute for New Energy Materials & Low-Carbon Technologies, School of Materials Science and Engineering, Tianjin University of Technology, Tianjin 300384, China. hlliu_tjut2016@163.com.

Dalton transactions (Cambridge, England : 2003)
|June 27, 2023
PubMed
概括

使用NiO/CeO2@NF异构的接口工程显著提高了5-基甲基 (HMFOR) 的电化学氧化到2,5-基酸 (FDCA),这是一个主要的生物质衍生化学物质.

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