GaN.

Eugene B Yakimov1, Yury O Kulanchikov1, Pavel S Vergeles1

  • 1Institute of Microelectronics Technology RAS, Chernogolovka 142432, Russia.

Micromachines
|June 28, 2023
PubMed
概括

失位在室温化 (GaN) 中很容易移动,受到内在特性和外部障碍的影响. 电子束辐射显著降低了脱位滑行所需的能量.