模拟声波散射与应变效应对MoS2场效应晶体管电气性能的影响
Huei Chaeng Chin1, Afiq Hamzah1, Nurul Ezaila Alias1
1Faculty of Electrical Engineering, Universiti Teknologi Malaysia, Skudai 81310, Johor, Malaysia.
Micromachines
|June 28, 2023
概括
二硫化物 (MoS2) 晶体管由于声子散射而减少电流,随着温度的上升而恶化. 应变和高k介电材料可以提高性能,Al2O3和HfO2产生出色的下值摆动和开关比率.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 固态物理 固态物理
背景情况:
- 二硫化物 (MoS2) 是纳米电子设备的有希望的材料,因为它具有独特的电子和机械性能.
- 了解基于MoS2的场效应晶体管 (FET) 中的电荷传输机制对于设备优化至关重要.
研究的目的:
- 使用分析建模框架研究MoS2 FETs的I-V特性.
- 分析声子散射和应变对设备性能的影响.
- 评估高k介电剂在减轻散射效应方面的有效性.
主要方法:
- 基于双接触电路模型的弹道电流方程的开发.
- 考虑声学和光学平均自由路径的传输概率的推导.
- 将声子散射效应和应变影响纳入弹道电流方程.
- 分析使用Al2O3和HfO2.3等高k介电材料的设备性能.
主要成果:
- 在10纳米的通道长度和室温下,波散射使弹道电流减少了43.7%.
- 散射效应随着温度的增加而加剧.
- 压缩应变使声子散射电流增加了13.3%,而拉伸应变则使其减少了13.3%.
- 高k介电材料显著提高了性能,在6nm通道长度下弹道电流增加了58.4%.
- 实现了Al2O3的68.2mV/dec的下值波动 (SS) 和HfO2.2的7.75 × 10^4的开关比.
结论:
- 声波散射是限制MoS2 FET性能的一个重要因素,特别是在更高的温度下.
- 应变工程提供了一种调整散射效应和调节设备电流的方法.
- 高k介电物的集成是一种有效的策略,可以提高MoS2 FET的性能,从而改善下值摆动和开关比率.
- 分析模型为理解和预测基于MoS2的纳米电子设备的行为提供了经过验证的框架.
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