:/3D

M Chen1, M P Nijboer1, A Y Kovalgin2

  • 1Inorganic Membranes, Department of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7500 AE Enschede, The Netherlands. m.chen@utwente.nl.

概括

大气压原子层沉积 (ALD) 提供了具有成本效益的超薄膜涂层. 本综述涵盖了空间ALD (s-ALD) 和时间ALD (t-ALD) 的近期应用,特别是3D和多孔材料.