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Updated: Jul 25, 2025
Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
Published on: June 12, 2018
Jiaqi Song, Baolei Liu, Xuchen Shan+2
这项研究引入了双路径自我调整的极化干扰光刻法 (Dp-SAP IL),用于精确的纳米结构制造. Dp-SAP IL方法实现了高度,统一的周期纳米结构和可调节的准晶体,具有高对比度干扰边缘.
Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
Published on: January 27, 2017
Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
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