使用DFT-ALIE计算的N氧化区域选择性和风险预测
Gabriel A Valdivia-Berroeta1, Nina C Gonnella2
1Department of Material and Analytical Sciences, Boehringer Ingelheim Pharmaceuticals, Inc., P.O. Box 368, Ridgefield, CT, 06877, USA. gabriel.valdivia-berroeta@boehringer-ingelheim.com.
Pharmaceutical research
|June 29, 2023
概括
药物开发过程中氧化的形成是影响药物活性和制造能力的一个问题. 本研究介绍了一种使用平均局部电离能 (ALIE) 的计算方法,用于预测和分类原子对N-氧化敏感性.
科学领域:
- 计算化学计算化学
- 药物开发 药物开发
- 药用化学 医学化学
背景情况:
- 氧化降解剂在新药开发中具有重大风险,影响药理活性,可溶性,稳定性,毒性和疗效.
- 导致N-氧化物的化学转化也可能损害药物制造能力所必需的物理化学性质.
- 早期识别和控制N-氧化物形成对于成功的治疗开发至关重要.
研究的目的:
- 开发一种in-silico计算方法,用于识别活性药物成分 (API) 中潜在的N-氧化物形成.
- 用计算方法评估原子对自氧化的易感性.
主要方法:
- 在B3LYP/6-31G(d,p) 理论层面上利用了分子建模和密度函数理论 (DFT).
- 执行了平均局部电离能 (ALIE) 的计算.
- 在15种不同的可氧化类型中分析了257个原子.
主要成果:
- 证明ALIE可靠地预测了对N氧化物形成最敏感的原子.
- 开发了一个风险尺度,将氧化脆弱性分为低,中或高.
- 该方法为评估氧化风险提供了定量衡量.
结论:
- 开发的in-silico工艺是一种强大的工具,用于识别对N-氧化的结构易感性.
- 能够快速阐明结构,并有助于解决药物开发中的潜在实验模两可.
- 促进主动控制氧化的形成,提高药物安全性和可制造性.
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