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    科学领域:

    • 半导体制造业 半导体制造业
    • 光学计量学 在光学计量学
    • 纳米技术纳米技术

    背景情况:

    • 现代半导体制造需要严格的覆盖控制.
    • 基于衍射的覆盖层 (DBO) 计量对于实现这种控制至关重要.
    • 多波长测量通常是必要的强大的DBO在存在的目标变形.

    研究的目的:

    • 提出一种新的多光谱DBO计量方法.
    • 为了实现对叠加错误的直接和快照测量.
    • 为了提高半导体覆盖计量学的精度和稳定性.

    主要方法:

    • 使用叠加错误和特定非对角线的穆勒矩阵元素 (ΔM) 之间的线性关系.
    • 分析覆盖目标格的零次衍射.
    • 在没有旋转或主动偏振元件的情况下实施快照测量技术.

    主要成果:

    • 在单一拍摄中证明了对多光谱覆盖计量学的能力.
    • 通过模拟结果验证了拟议的方法.
    • 展示了在广泛的光谱范围内对 ΔM 的直接测量.

    结论:

    • 拟议的多谱DBO计量技术为先进的半导体制造提供了一个有前途的解决方案.
    • 快照,直接测量方法简化和增强了叠加计量学.
    • 这种方法提供了准确和强大的叠加错误评估,即使有目标变形.