了解在CO/氧化物界面上的电压控制的磁性异构效应
Tomohiro Nozaki1, Jun Okabayashi2, Shingo Tamaru3
1Research Center for Emerging Computing Technologies (RCECT), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki, 305-8568, Japan. nozaki.tomohiro@aist.go.jp.
Scientific reports
|June 30, 2023
概括
后化增强了电压控制磁性异构性 (VCMA) 在fcc-Co-(111) 堆中的效果. 这项研究揭示了在CO/氧化物接口上的Pt扩散增加了轨道磁矩,促进了用于自旋电子设备的VCMA.
科学领域:
- 这就是Spintronics.
- 材料科学 材料科学 材料科学
- 表面科学是一门学科.
背景情况:
- 电压控制磁性异构性 (VCMA) 对于高速,低功率的自旋电子器件至关重要.
- 基于Fcc-Co-(111) 的堆显示出大VCMA系数的潜力,但研究不足.
- 在回收后的Pt/Ru/Co/CoO/TiOx结构中增强VCMA背后的机制尚不清楚.
研究的目的:
- 研究Pt/Ru/Co/CoO/TiOx结构中的CO/氧化物接口的VCMA效应的起源.
- 了解在后回火后观察到的电压控制强制性 (VCC) 增加背后的机制.
- 为设计基于fcc-Co-(111) 的堆和增强的VCMA提供洞察力.
主要方法:
- 在化前后对Pt/Ru/Co/CoO/TiOx结构进行了多探头分析.
- 用X射线磁圆二元化 (XMCD) 测量来分析磁性质.
- 进行了结构性表征,以了解原子的排列和扩散.
主要成果:
- 后化显著增加了电压控制的Pt/Ru/Co/CoO/TiOx结构的强制性.
- XMCD测量显示,在后化后,在CO/氧化物接口的轨道磁矩增加.
- 有证据表明,Pt原子扩散到CO/氧化物接口增强了接口特性.
结论:
- 建议将Pt扩散到CO/氧化物接口中作为增强VCMA的机制.
- 增加的界面轨道磁矩与改善的VCMA相关.
- 这些发现提供了一个设计策略,用于优化基于fcc-Co-(111) 的spintronic应用中的VCMA.
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