微镜和格阵列中的极化控制:可见-红外光谱范围中的性能
Haoran Mu1, Daniel Smith1, Tomas Katkus1
1Optical Sciences Centre, Australian Research Council (ARC) Industrial Transformation Training Centre in Surface Engineering for Advanced Materials (SEAM), Swinburne University of Technology, Hawthorn, VIC 3122, Australia.
Micromachines
|July 8, 2023
概括
五秒钟直接激光写作为紧的光学系统制造了先进的微镜阵列 (MLA) 和石墨烯氧化物偏振器. 这些微光元件在红外频谱中表现出高性能.
科学领域:
- 光学和光子学 在光学和光子学.
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
背景情况:
- 微镜头阵列 (MLA) 是紧集成系统的关键微光学元件.
- 开发具有高保真度和特定光学特性的MLA对于先进的应用是必不可少的.
- 整合衍射和折射能力可以增强微型光学设置.
研究的目的:
- 使用 femtosecond直接激光写入 (fs-DLW) 制造高保真度微镜阵列 (MLA) 和氧化石墨烯 (GO) 格子.
- 在可见红外光谱窗口中描述MLA和GO偏光器的光学性能.
- 将MLA和GO偏振器结合起来,用于微型光学系统中的分散控制.
主要方法:
- 在CaF2基板上使用fs-DLW制造SZ2080光电阻中的MLA.
- 石墨烯氧化物 (GO) 网格线性偏振器的制造,采用fs-DLW去除GO薄膜.
- 在可见-红外光谱中对MLA和GO极化剂的特征.
- 数字建模用于模拟和验证光学性能.
主要成果:
- 在2-5μm光谱区域实现了~50%传导率的MLA.
- 制造的超薄GO偏振器与MLA集成兼容.
- 在实验MLA聚焦和模拟结果之间表现出良好的一致性.
- 制造了数值孔径为0.3的MLA,其镜头高度与红外波长相当.
结论:
- fs-DLW是一种可行的技术,用于制造高性能MLA和GO偏振器.
- 集成的MLA-GO极化器系统为先进的分散控制提供了潜力.
- 开发的微光元件适用于在红外光谱中运行的紧集成光学系统.
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