工程缓冲层,以提高磁道连接传感器的温度弹性
P D R Araujo1,2, R Macedo1, E Paz3
1Instituto de Engenharia de Sistemas E Computadores-Microsistemas e Nanotecnologias (INESC MN), Lisbon, Portugal.
Nanotechnology
|July 20, 2023
概括
这项研究研究了磁道连接处 (MTJs) 对于恶劣环境的热弹性. [Ta/Ru]缓冲器提高了MTJ性能,最高可达200°C,对于高温传感应用至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 磁道连接 (MTJ) 对于传感应用至关重要.
- 热降解限制了MTJ在恶劣环境中的运行.
- 优化热弹性是先进传感的关键.
研究的目的:
- 研究温度对MGO-MTJ磁性参考降解的影响.
- 了解形态和磁性参数对热行为的影响.
- 确定高温MTJ操作的最佳缓冲层.
主要方法:
- 研究了MnIr/CoFe双层和复杂的MgO-MTJ堆.
- 使用离子束沉积和磁铁子喷射,没有真空断裂.
- 调整交换偏差合场,强制场和阻断温度分布.
主要成果:
- [Ta/CuN]缓冲器在室温下表现出优异的性能 (例如H_ex).
- [Ta/Ru]缓冲器显示出更广泛的反铁磁合高原 (ΔH) 温度高达200°C.
- 缓冲层的设计显著影响MTJ的热弹性.
结论:
- 缓冲层的选择对于高温MTJ性能至关重要.
- [Ta/Ru]缓冲器为传感应用提供了增强的热稳定性.
- 对温度的全面MTJ分析对于最佳设计至关重要.
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