基于的Bi0.9La0.1FeO3铁电道连接记忆器用于卷积神经网络应用程序
Gongjie Liu1, Wei Wang1, Zhenqiang Guo1
1Key Laboratory of brain-like neuromorphic devices and Systems of Hebei Province, College of Electron and Information Engineering, Hebei University, Baoding 071002, P. R. China. yanxiaobing@ime.ac.cn.
本研究介绍了一种稳定的铁电道连接记忆器,用于内存计算 (CIM). 该设备能够实现高效的突触功能,在图像处理和神经网络模拟中实现高精度,克服了·诺伊曼架构的局限性.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 计算机工程 计算机工程
背景情况:
- ·诺伊曼架构由于数据传输限制而面临性能瓶.
- 传统的导电光纤记忆器在先进的计算应用中表现不稳定.
- 铁电道结 (FTJ) 为非易失性记忆和神经形态计算提供了一个有前途的替代方案.
研究的目的:
- 开发一种基于铁电道连接的高性能,非挥发性memristor,用于内存计算 (CIM).
- 为了证明该设备在模拟人工智能应用中的突触功能方面的能力.
- 通过新的memristor技术来解决·诺伊曼架构的局限性.
主要方法:
- 在基板上制造一个Pd/Bi0.9La0.1FeO3 (BLFO) /La0.67Sr0.33MnO3 (LSMO) 铁电道连接记忆器.
- 使用由脉冲刺激触发的铁电极化逆转来调节设备导电性并实现突触可塑性.
- 实现用于图像处理任务的memristor,并模拟VGG8卷积神经网络 (CNN).
主要成果:
- FTJ记忆器表现出稳定的非挥发性运行,可调节的导电状态.
- 该设备成功模拟了各种突触功能,在重量更新中具有高线性和对称性.
- 在图像处理方面表现出色,并在Cifar-10数据集上实现了CNN离线学习的92.07%的识别准确度.
结论:
- 开发的FTJ记忆器为内存应用中的计算提供了稳定和高性能解决方案.
- 这项技术提供了一条可行的途径,以克服诺曼架构的瓶.
- 该设备显示了未来神经形态计算和AI硬件加速的巨大潜力.
更多相关视频
10:40A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
09:49In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
相关概念视频
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET
In an n-MOSFET, the structure includes n-type source and drain...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Biasing of FET
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
