压力和压力光学效应增强的核心外结构基于纳米线的场效应晶体管
Xiang Liu1,2, Fangpei Li1,2,3, Wenbo Peng1,2
1School of Microelectronics, Xi'an Jiaotong University, Xi'an 710049, China.
Micromachines
|July 29, 2023
概括
这项研究模拟Si/ZnO纳米线异质连接场效应晶体管 (HJFETs),以探索压缩和压缩光学效应. 结果显示,在应变下电流调节显著,Si/ZnO HJFET的性能优于ZnO/Si对应物.
科学领域:
- 半导体物理 半导体物理
- 纳米技术 纳米技术
- 材料科学 材料科学 材料科学
背景情况:
- 压子和压子-光子效应对于先进的电子和光电子技术至关重要.
- 场效应晶体管 (FET) 是电子设备中的基本组件.
研究的目的:
- 系统地研究基于核心外结构的纳米线异质连接FET (HJFETs) 中的平热电子和平热光电子效应.
- 分析各种参数对压力下的HJFET性能的影响.
主要方法:
- 用有限元法 (FEM) 来建立Si/ZnO和ZnO/Si核心外纳米线HJFET模型.
- 进行了参数扫描分析,以评估尺寸,兴奋剂和电压对设备性能的影响.
- 模拟了对和电流的拉伸和压缩应变效应.
主要成果:
- 通道电流对通道辐射厚度,通道兴奋剂度,通道长度,门兴奋剂度和门电压敏感.
- 在0.39拉伸力下,Si/ZnO HJFET的和电流变化率为38%.
- ZnO/Si HJFETs在 -0.39压缩应变下显示出较小的和电流变化率,为18%.
结论:
- 由压电电位和光生成的电机力介导的压电和压光学效应显著调节HJFET中的载波分布和通道导电性.
- 与ZnO/Si相比,Si/ZnO核心外结构表现出优越的应变调制性能.
- 这些发现为设计基于Zn的HJFET和其他FET设备提供了宝贵的见解.
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