具有轻度剂源的JLTFET的单粒子辐射效应和反辐射优化
Haiwu Xie1,2, Hongxia Liu1
1Key Laboratory for Wide-Band Gap Semiconductor Materials and Devices of Education, The School of Microelectronics, Xidian University, Xi'an 710071, China.
Micromachines
|July 29, 2023
概括
这项研究研究了粒子辐射对无连接道场效应晶体管的影响. 优化介电材料和门长度可以提高设备对重离子诱导的短暂电流的可靠性.
科学领域:
- 半导体设备物理学 半导体设备物理
- 电子产品中的辐射效应.
- 先进的晶体管技术的技术.
背景情况:
- 无连接道场效应晶体管 (JLTFET) 容易受到粒子辐射的单一事件影响.
- 沉重的离子产生电子孔对,可能导致瞬态电流,扭转设备逻辑状态.
- 了解这些影响对于在辐射环境中可靠运行至关重要.
研究的目的:
- 分析粒子辐射对特定JLTFET设计 (DMG-GDS-HJLTFET) 的影响.
- 研究各种参数对单粒子效应的影响.
- 为了优化设备设计以提高辐射硬度.
主要方法:
- 一个轻度杂的高斯源异构结构无连接道场效应晶体管 (DMG-GDS-HJLTFET) 的设备模拟.
- 分析参数,包括发生的离子能量,角度,位置,完成时间和排水偏差.
- 对辅助门介电和道门长度的可靠性进行评估.
主要成果:
- 对于辅助门介电材料,建议使用高介电常数材料,如氧化 (HfO2).
- 大约10纳米的道门长度被确定为最佳的抗辐射设计.
- 模拟结果将道道长度与峰值短暂排水电流和脉冲宽度相关联.
结论:
- 通过材料选择和结构优化,可以显著提高对粒子辐射的设备可靠性.
- 作为辅助门介电器的HfO2提供了卓越的辐射保护.
- 精确控制道道长度对于减轻辐射诱导的短暂电流至关重要.
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