基于CMOS兼容SiO的电阻切换设备的电气特性
Maria N Koryazhkina1, Dmitry O Filatov1, Stanislav V Tikhov1
1Research and Education Center "Physics of Solid-State Nanostructures", National Research Lobachevsky State University of Nizhny Novgorod, 603022 Nizhny Novgorod, Russia.
Nanomaterials (Basel, Switzerland)
|July 29, 2023
概括
使用氧化和化的记忆装置显示出有前途的电阻切换. 热处理使神经形态计算应用程序的突触行为稳定.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 纳米技术 纳米技术
背景情况:
- 记忆器件对于下一代神经形态系统至关重要.
- 与现有制造工艺 (CMOS) 的兼容性对于集成至关重要.
- 了解电阻开关机制是设备优化的关键.
研究的目的:
- 为了研究电气和电阻切换器件的电气和电阻切换特性.
- 评估热处理对设备稳定性和功能的影响.
- 探索这些设备在硬件神经形态系统中的潜力.
主要方法:
- 使用氧化 (绝缘体) 和化 (电极) 制造记忆装置.
- 电气性能和电阻切换在广泛的温度范围内进行表征.
- 在高阻力状态 (HRS) 和低阻力状态 (LRS) 中分析传导机制.
主要成果:
- 设备在热处理后表现出双极电阻切换与突触行为.
- 导电机制涉及陷诱导的细丝,在HRS (激活性质) 和LRS (欧姆定律和道) 中具有不同的行为.
- 在没有热处理的情况下,即制造的设备缺乏稳定的阻力状态.
结论:
- 兼容CMOS的材料和低温制造使其能够高效地集成.
- 研究的记忆器件显示了实现硬件神经形态系统的潜力.
- 热处理对于实现稳定和功能性的突触行为至关重要.
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