低于5nm的门长单层二烯晶体管
Qiang Li1, Xingyi Tan2, Yongming Yang1
1College of Intelligent Systems Science and Engineering, Hubei Minzu University, Enshi 445000, China.
Molecules (Basel, Switzerland)
|July 29, 2023
概括
单层烯场效应晶体管 (FET) 对未来的电子产品显示出希望. 模拟表明,3纳米门长的FET可以满足高性能标准,可能扩展摩尔定律的扩展.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 场效应晶体管 (FET) 面临着扩展限制.
- 二维 (2D) 半导体提供了替代通道材料.
- 空气稳定的2D纳米板FET已经经过实验证明.
研究的目的:
- 为了研究低于5nm门长的双门单层 (ML) 烯FETs的潜力.
- 评估ML selenene作为未来高性能电子设备的候选者.
- 根据已建立的行业标准评估绩效指标.
主要方法:
- 最初的量子运输模拟被使用.
- 专注于双门单层 (ML) 烯场效应晶体管 (FET).
- 考虑负电容技术和底层效应.
主要成果:
- 模拟预测3纳米门长 p型ML selenene FETs可以满足2013年ITRS标准.
- 对扶手椅和齐格扎克晶体学方向的性能进行了分析.
- 2028年的技术视野被用作基准.
结论:
- 单层烯显示出作为先进FET的通道材料的潜力.
- ML基FET可以使摩尔定律扩展到3nm门长度.
- 这项研究强调了selenene在下一代半导体技术中的可行性.
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