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工程立方体立方体N-化C涂层p-CuO/n-TiO₂异质结向高性能光催化交叉脱联接

Shuo Zhou¹, Qiuyan Shen¹, Feng-Lei Yang¹

¹Jiangsu Key Laboratory of Green Synthetic Chemistry for Functional Materials, School of Chemistry and Material Science, Jiangsu Normal University, Xuzhou, Jiangsu 221116, P. R. China. yangfl@jsnu.edu.cn.

|July 31, 2023

概括

合成了一种新的添加碳涂 CuO/TiO2 p-n 异构连接 (CuO-TiO2@N-C). 这种材料通过提高交叉脱联反应的电子孔分离效率来显著增强光催化活性.

科学领域:

材料科学材料科学材料科学
光催化作用的光催化
纳米技术纳米技术

背景情况:

光生成的电子孔对的低分离效率限制了光催化剂的激活.
p-n半导体异质连接提供了一种通过内部电场增强电荷分离的策略.

研究的目的:

设计和制造一个新的立方体N-化碳涂层CuO/TiO2 p-n异构连接 (CuO-TiO2@N-C).
为了研究制造的异质连接的增强光催化性能.

主要方法:

用四烯酸酸盐直接化一个胺调制的立方体HKUST-Cu.
结构特征和密度函数理论 (DFT) 计算.
光电流密度测量. 光流密度测量.

主要成果:

成功合成了CuO-TiO2@N-C,具有立方体结构和N-doped碳涂层.
DFT计算和表征证实了CuO/TiO2 p-n异构在促进电荷传输和分离方面的作用.
与对照组相比,CuO-TiO2@N-C的光电流密度显著更高 (0.042 μA cm−2).
化碳涂层增强了导电性,多孔性,稳定性和表面反应性.

结论:

制造的CuO-TiO2@N-C p-n异构连接有效地提高了电子孔生成和分离效率.
该材料表现出卓越的光催化效率,稳定性和对交叉脱加反应的基质范围.
这项工作为开发先进光催化剂提供了一个有前途的战略.

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