稀释兴奋剂及其对MoS2缺陷的影响
Riccardo Torsi1, Kyle T Munson2, Rahul Pendurthi3
1Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.
ACS nano
|August 3, 2023
概括
将 (Re) 添加到二硫化 (MoS2) 单层中,可以显著减少硫缺陷. 这种兴奋剂提高了晶体质量,并提高了2D材料中的晶体管性能.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术 纳米技术
背景情况:
- 像MoS2这样的二维过渡金属二甲基化物 (TMD) 对先进的电子和光电子设备至关重要.
- 控制TMD中的缺陷对于优化设备性能至关重要.
研究的目的:
- 为了研究替代 (Re) 兴奋剂对二硫化物 (MoS2) 单层的影响.
- 了解 Re 兴奋剂如何影响缺陷密度,生长动态和 MoS2.2. 的电子性质.
主要方法:
- 使用金属有机化学蒸汽沉积 (MOCVD) 的MoS2单层与Re的替代注.
- 使用光发光 (PL) 光谱学对缺陷密度的表征.
- 使用*ab initio*方法研究缺陷形成能量的计算建模.
- 基于Re-doped MoS2.2的场效应晶体管 (FET) 的制造和测试
主要成果:
- 实现了对MoS2降低到500ppm的可控制的再兴奋剂.
- 微量Re减少了硫位点缺陷密度的5到10倍.
- 反注射抑制了0.05%的缺陷光发光量6倍,并在1%的反率下完全灭了它.
- Re-MoS2晶体管显示,与未使用过的MoS2.2晶体管相比,排水电流和载体移动性增加了2倍.
结论:
- 替代性反是减少MoS2单层中硫空缺的有效策略.
- 降低缺陷密度可以改善载体运输和提高设备性能.
- 这项研究提供了对高质量的2D材料的剂控制生长动态的见解.
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