诱导线路道FET使用带轴道层与Ge源和充电增强绝缘
Jyi-Tsong Lin1, Yen-Chen Chang2
1Department of Electrical Engineering, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan, ROC. jtlin@ee.nsysu.edu.tw.
Discover nano
|August 5, 2023
概括
我们开发了一种用于低功耗电子的新型电荷增强绝缘带轴道层源感应道场效应晶体管 (CEI ETL GS-iTFET). 该设备实现了的下值摆动和高开/关电流比,降低了制造成本.
科学领域:
- 半导体设备物理学的物理
- 材料科学是一种材料科学.
- 纳米电子学纳米电子学
背景情况:
- 传统的晶体管在扩展和功率效率方面存在局限性.
- 道场效应晶体管 (TFET) 提供了降低功耗的潜力.
- 优化TFET架构对于提高性能至关重要.
研究的目的:
- 提出和模拟一种新的电荷增强绝缘环形道层源感应道场效应晶体管 (CEI ETL GS-iTFET).
- 为了增强线路道和导电流,同时抑制泄漏.
- 评估设备性能和制造可行性,用于低功耗应用.
主要方法:
- 设备设计包括源,表轴道层 (ETL) 和充电增强绝缘 (CEI).
- 完整的门源重叠为改进的线路道.
- 与一起形成异质连接,用于增强电流.
- 基于校准的模拟方法考虑过程变化.
- 分析关键绩效指标:下值波动,当前开启和开启/关闭比率.
主要成果:
- 在Vd=0.2V时达到30.5mV/dec的平均下值波动 (SSavg).
- 获得的电流 (离子) 为3.12 × 10−5 A/μm.
- 证明了高的离子/离子比率为1.81 × 1010.
- 使用Si3N4CEI在源和Schottky金属之间减少载体损失.
- 消除了对多个植入步骤的需求,降低了制造成本.
结论:
- 拟议的CEI ETL GS-iTFET表现出卓越的性能,具有的下值波动和高的开/关比.
- 该设备的设计有效地抑制了泄漏,并增强了传导电流.
- 简化制造过程提供了显著的成本优势.
- CEI ETL GS-iTFET显示了下一代低功耗电子设备的巨大潜力.
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