通过硫空隙工程来接近理想的单层MoS2晶体管的欧姆接触
Jiankun Xiao1, Kuanglei Chen1, Xiankun Zhang1,2
1Academy for Advanced Interdisciplinary Science and Technology, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China.
Small methods
|August 8, 2023
概括
工程师使用硫空位为二硫化物 (MoS2) 场效应晶体管 (FET) 创建了低电阻电接触. 这一突破提高了未来原子薄集成电路的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术 纳米技术
- 半导体物理 半导体物理
背景情况:
- 像MoS2这样的单层二维半导体是未来晶圆芯片技术的关键.
- 金属半导体接口的高接触电阻阻碍了二维半导体FET的性能.
研究的目的:
- 开发一种可扩展的方法,在单层MoS2 FET中实现欧姆接触.
- 调查硫空缺在降低接触电阻和提高设备性能方面的作用.
主要方法:
- 硫空隙工程被用来创建欧姆接触.
- 血治疗的持续时间进行了调整,以控制硫空置度.
- 测量了具有不同硫空置度的MoS2 FET的电气特性.
主要成果:
- 在接触电阻低至1.7kΩ·μm的情况下实现了欧姆接触.
- 显著改善了FET性能:载体移动性为153 cm2 V-1 s-1,开/关比为4 × 10^9,和和电流为342 μA μm-1.1.
- 证实了由于硫空缺而增加的电子兴奋剂和降低的舒特基屏障是性能提升的主要驱动因素.
结论:
- 硫空缺工程为制造高性能MoS2 FET提供了一个简单且可扩展的策略.
- 这种方法促进了工业化原子薄集成电路的开发.
- 这些发现为克服二维半导体设备技术的局限性提供了一条途径.
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