头骨底部脑:是叶的隐藏原因
R Pillai1, A Chheda1, S Agrawal1
1Department of Neurology, Seth GS Medical College and KEM Hospital, Mumbai, India.
Journal of postgraduate medicine
|August 9, 2023
概括
高分辨率的3T核磁共振扫描可以在以前被诊断为核磁共振阴性 (TLE) 的患者中检测到叶脑脊髓 (TE). 这一发现可以导致耐火性的成功手术结果.
科学领域:
- 神经学 神经学
- 神经成像是一种神经成像.
- 的研究研究.
背景情况:
- 叶 (TLE) 是焦点的一种常见形式.
- 在一些TLE病例中,标准MRI可能无法检测出潜在的原因,导致"MRI阴性"诊断.
- 耐火性TLE带来了重大的管理挑战.
研究的目的:
- 调查高分辨率3TMRI在MRI阴性TLE患者中识别叶脑脊髓 (TE) 的实用性.
- 评估 TE 作为耐火 TLE 的原因的潜力.
- 为了评估诊断TE的患者的外科治疗结果.
主要方法:
- 使用高分辨率3TMRI重新评估以前被诊断为MRI阴性TLE的患者.
- 对长期视频脑电图 (VEEG) 数据的分析.
- 包括通过半观学,直径/直径EEG和PET研究诊断的患者.
主要成果:
- 在5名患者中,之前有1.5TMRI阴性TLE,其中2名患者在3TMRI上被诊断为TE.
- 一名TE患者在经过电皮质谱指导切除手术后一年实现了恩格尔的I类自由.
- 大多数TLE患者 (99/104) 在初始MRI上表现出叶异常.
结论:
- 高分辨率的3T核磁共振成像对于在特定的TLE患者中检测叶脑脊髓 (TE) 是至关重要的.
- 应将TE视为耐火叶 (TLE) 的潜在原因.
- 识别和切除TE可以导致在TLE中成功控制发作.
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