使0.25μmGaN HEMT.

Jeong-Geun Kim1, Donghyun Baek2

  • 1Department of Electronic Engineering, Kwangwoon University, Seoul 01897, Republic of Korea.

PubMed
概括

这项研究介绍了一种使用化高电子移动性晶体管 (GaN HEMT) 技术制造的新型4位真实时间延迟集成电路 (IC),可实现宽带性能的无束式相位阵列天线.

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