通过Gd兴奋剂工程调节基于HfO2的RRAM的电阻切换稳定性:DFT+U
Dong-Lan Zhang1, Jiong Wang1, Qing Wu2
1State Key Laboratory of Powder Metallurgy, Central South University, Changsha 410083, China. wangjionga@csu.edu.cn.
Physical chemistry chemical physics : PCCP
|August 15, 2023
概括
在基于氧化 (HfO2) 的电阻随机存取存储器 (RRAM) 中加多兴奋剂增强了导电性和设备稳定性. 这种稀土兴奋剂调节氧空位行为,改善非挥发性记忆和神经形态计算应用的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 计算材料科学科学 计算材料科学
背景情况:
- 基于氧化物的电阻随机访问存储器 (RRAM) 对非易失性存储器和神经形态计算至关重要.
- 性能要求需要先进的材料和兴奋剂策略.
- 稀土兴奋剂是调节RRAM性能的一个关键方法.
研究的目的:
- 研究加多 (Gd) 化 HfO2 基 RRAM 中电阻切换 (RS) 调制的机制.
- 了解Gd兴奋剂对电子结构和缺陷行为的影响.
- 通过兴奋剂工程来改善RRAM性能提供见解.
主要方法:
- 使用第一原则计算来研究Gd化HfO2.
- 进行电子结构分析以了解兴奋剂效应.
- 热力学和动力学研究研究了缺陷相互作用和迁移障碍.
主要成果:
- Gd 兴奋剂改变了 HfO2 缺陷系统的局部几何结构.
- 在Gd和氧空位 (VO) 周围增强的库伦相互作用增加了导电性.
- 强大的Gd-VO相互作用吸引了VO,并增加了迁移能量障碍,抑制了随机光线的形成.
- 观察到RS参数的统一性和稳定性得到改善.
结论:
- 在基于HfO2的RRAM中,Gd兴奋剂有效调节RS行为.
- 该研究阐明了提高导电性和稳定性背后的机制.
- 这些发现为通过RRAM设备中的兴奋剂工程提高性能提供了一条途径.
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