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Updated: Jul 19, 2025

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侧向通道内ALD生长的合规性模拟:扩散反应模型和弹道运输反应模型之间的比较
Jänis Järvilehto1, Jorge A Velasco1, Jihong Yim1
1Department of Chemical and Metallurgical Engineering, School of Chemical Engineering, Aalto University, P.O. Box 16100, FI-00076 AALTO, Finland. janis.jarvilehto@aalto.fi.
本研究比较了两个原子层沉积 (ALD) 模型在高面比结构中. 弹道运输反应 (BTR) 模型显示比扩散反应 (DR) 模型更深的透和更广泛的吸附前线.
科学领域:
- 材料科学 材料科学 材料科学
- 化学工程是化学工程的重要组成部分.
- 纳米技术纳米技术
背景情况:
- 原子层沉积 (ALD) 对于涂层高面比 (HAR) 结构至关重要.
- 在HAR结构中建模ALD合规性涉及扩散反应 (DR),弹道运输反应 (BTR) 和蒙特卡洛模拟.
研究的目的:
- 在HAR结构中对ALD用DR和BTR模型生成的和概况进行比较.
- 分析符合性建模中的定性和定量差异.
主要方法:
- 从DR和BTR模型中比较和概况.
- 使用半覆盖透深度,半覆盖斜率和吸附前线宽度进行定量分析.
主要成果:
- DR和BTR模型之间的定性一致性,BTR显示结构"干部"的表面覆盖率较高.
- 定量差异:与DR模型相比,BTR模型表现出更深的透,更低的斜率值和更宽的吸附前线.
结论:
- DR和BTR模型之间的差异影响了从ALD和概况中提取动力参数.
- 了解这些模型差异对于HAR应用中精确的ALD流程优化至关重要.
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