无形半导体氧化物基模拟电阻切换内存的接口粗效应和放松动态
G R Haripriya1, Hee Yeon Noh1, Chan-Kang Lee1
1Division of Nanotechnology, DGIST, 42988, South Korea. dear.hjlee@dgist.ac.kr.
Nanoscale
|August 22, 2023
概括
这项研究介绍了带有电极的无形氧化 (a-IGZO) 记忆器,显示了模拟电阻切换. 这些设备提供稳定的保留和成本效益高的神经形态计算的潜力.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 电气工程 电气工程
背景情况:
- 电阻切换内存设备对于下一代电子产品至关重要.
- 像InGaZnO (IGZO) 这样的无形氧化物半导体为memristors提供了有前途的性能.
- 接口工程是控制设备性能的关键.
研究的目的:
- 为了研究Al/a-IGZO/AlOx/Al记忆器的模拟电阻切换特性.
- 了解电极沉积率对设备性能和切换行为的影响.
- 评估这些设备在神经形态计算应用中的潜力.
主要方法:
- 制造具有不同电极沉积率的Al/a-IGZO/AlOx/Al设备.
- 电流电气特性,包括保留和耐久性测试.
- 导电机制和放松动力学的分析.
主要成果:
- 在制造的设备中观察到模拟电阻开关行为.
- 确定了电极沉积率和表面粗度作为影响异常切换的因素.
- 获得了令人满意的保留,但耐力有限 (在200个循环后下降).
- 确定热离子辐射作为主要的导电机制.
- 在低衰变速率下,在长达5小时的时间内证明了稳定的电流水平.
结论:
- Al/a-IGZO/AlOx/Al 设备显示出有希望的模拟电阻开关特性.
- 表面粗度受电极沉积率的影响,在切换异常中起作用.
- a-IGZO的成本效益和无金属性质使其适合用于神经形态计算.
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