一个多通道和双重工作条件的晶圆缺陷检查原型的结构设计和模拟
Ruizhe Ding1,2,3, Haiyan Luo1,2,3, Zhiwei Li1,2,3
1Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China.
Micromachines
|August 26, 2023
概括
一个新的晶圆检查原型有效地检测表面和边缘缺陷使用四个通道. 它符合光学稳定性和结构设计要求,在半导体制造中实现了比200nm更好的检查灵敏度.
科学领域:
- 半导体制造业 半导体制造业
- 光学工程是指光学工程.
- 计量学 计量学 计量学
背景情况:
- 晶圆前端检查对于检测和分类无图案晶圆上的缺陷至关重要.
- 现有的缺陷检查方案往往针对缺陷类型和位置的具体.
研究的目的:
- 为全面的晶圆表面和边缘缺陷检查设计和验证一个原型.
- 确保原型符合严格的光学性能和结构完整性要求.
主要方法:
- 设计了一个具有四个检查通道的原型:散射,反射,相位和轮.
- 使用Ansys进行光学检测子系统的结构模拟.
- 对原型的检查灵敏度进行实验验证.
主要成果:
- 模拟结果证实光学性能稳定,最大变形为19.5微米,基本频率为96.9赫兹.
- 实验结果表明,检查灵敏度优于200nm相当的PSL球形缺陷.
结论:
- 开发的原型成功满足了表面和边缘晶圆缺陷检查的设计要求.
- 该原型具有高灵敏度,对于先进的半导体制造工艺至关重要.
相关概念视频
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