MoS2

Michaela Sojková1, Igor Píš2, Jana Hrdá1

  • 1Institute of Electrical Engineering, SAS, Dúbravská cesta 9, 841 04 Bratislava, Slovakia.

Chemistry of materials : a publication of the American Chemical Society
|August 28, 2023
PubMed
概括

间隔促进了二硫化物 (MoS) 少数层薄膜的表生长和水平对齐. 这种新方法为先进的应用提供了稳定,水平对齐的化MoS2.