硫空隙和SiO2的单步被动化MoS2的接口陷设备
Byungwook Ahn1, Yoonsok Kim2,3, Meeree Kim4
1Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Nano letters
|August 30, 2023
概括
这项研究引入了单个质子注射处理,以使多层二硫化物 (MoS2) 场效应晶体管 (FET) 的缺陷被动化. 这种方法通过解决通道和接口陷,显著提高了载体的移动性.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 过渡金属二化物 (TMD) 为设备提供独特的电子特性.
- 在TMD通道和网关氧化物中的缺陷点会产生陷,阻碍设备的性能.
- 现有的方法需要对通道和接口缺陷进行单独的处理.
研究的目的:
- 开发一种单一,有效的治疗方法,用于消除多层MoS2场效应晶体管 (FET) 中的被动化缺陷.
- 为了研究质子注射对陷密度和载体移动性的影响.
- 为了证明MoS2通道和SiO2门氧化物接口中的缺陷同时被动化.
主要方法:
- 使用后门偏差从H-TFSI滴滴中注入质子到多层MoS2.2.
- 使用低温运输测量来描述设备性能.
- 进行深层瞬态光谱 (DLTS) 来量化陷密度.
主要成果:
- 质子注入有效地使MoS2中的硫空缺被化到最低的检测水平.
- 该处理使MoS2/SiO2接口上的悬挂键被动化,提高了性能.
- 在SiO2基板上的载体流动性在处理后大约提高了2200%.
结论:
- 单个质子注射处理可以同时使MoS2通道和SiO2门氧化物中的缺陷被动化.
- 这种方法显著提高了MoS2 FET中的载体流动性,克服了以前方法的局限性.
- 这些发现为改善基于TMD的电子设备的性能铺平了道路.
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