极端紫外线诱导光酸生成的基于新机制的描述器:影响极端紫外线敏感性的关键因素
Ji Young Park1,2, Hyun-Ji Song2, Thanh Cuong Nguyen1
1Innovation Center, Samsung Electronics, Samsungjeonja-ro 1, Hwaseong-si 18448, Republic of Korea.
Molecules (Basel, Switzerland)
|September 9, 2023
概括
预测光酸发生器性能需要考虑电子陷和质子生成效率. 一个新的两参数模型改善了对先进的光刻材料的传统方法的预测.
科学领域:
- 材料科学 材料科学 材料科学
- 计算化学计算化学
- 摄影石版印刷 (photolithography) 是一种摄影方式.
背景情况:
- 预测光刻光学性能对于开发先进的图案制作过程至关重要,但由于复杂的材料相互作用而具有挑战性.
- 现有的模型通常仅依赖光酸发生器 (PAG) 最低的未占用分子轨道 (LUMO) 能量,这对于准确的性能预测是不够的.
研究的目的:
- 为了研究三硫离子的EUV诱导的光化学反应机制,一个模型PAG.
- 为了开发一个更准确的在 prediction 模型的PAG性能在光电刻板.
主要方法:
- 用原子尺度材料建模来研究三硫酸的EUV诱导的光化学反应.
- 开发了一个两参数预测模型,将LUMO能量和氧化能量在重新排列期间的变化纳入其中.
主要成果:
- 酸生成产量取决于PAG离子的LUMO能量 (电子陷效率) 和重新排列后的氧化能量变化 (质子生成效率).
- 开发的两参数模型显著优于传统的基于LUMO的预测模型,用于抵抗暴露剂量.
结论:
- 准确的PAG性能预测需要考虑电子捕获和质子生成效率,而不仅仅是LUMO能量.
- 这种新模型可促进新型PAG材料的计算选和反向设计,以提高光刻性能.
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