极端紫外线诱导光酸生成的基于新机制的描述器:影响极端紫外线敏感性的关键因素

Ji Young Park1,2, Hyun-Ji Song2, Thanh Cuong Nguyen1

  • 1Innovation Center, Samsung Electronics, Samsungjeonja-ro 1, Hwaseong-si 18448, Republic of Korea.

PubMed
概括

预测光酸发生器性能需要考虑电子陷和质子生成效率. 一个新的两参数模型改善了对先进的光刻材料的传统方法的预测.

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