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通过移植后反应制备UV解烯酸粘合剂

Juan Wang¹, Zhikai Dong¹, Jingwen Chen¹

¹College of Materials Science and Engineering, Nanjing Tech University, Nanjing 210009, China.

Materials (Basel, Switzerland)

|September 9, 2023

概括

一种新的后移植方法简化了用于半导体应用的紫外线脱烯酸粘剂 (UDAA) 制备. 这种先进的UDAA在紫外线暴露后提供强大的粘附性和易于拆卸,确保没有残留的表面.

科学领域:

聚合物化学聚合物化学
材料科学材料科学材料科学
粘附科学粘附科学粘附科学

背景情况:

紫外线解烯酸粘合剂 (UDAA) 在半导体制造中对于晶圆稳定性和清洁表面至关重要.
传统的UDAA合成涉及将异酸盐接种到基共体上,通常因过早的交叉链接而受到阻碍.
需要一种更强大,更有效的方法来生产具有受控解锁特性的UDAA.

研究的目的:

开发一种简单的移植后方法,用于合成紫外线解烯酸粘合剂.
调查这种新方法对粘合剂性能的影响,包括粘合,解和无残留性能.
描述合成的粘合剂,并为半导体应用优化其配方.

主要方法:

异酸功能单体 (IPDI-H) 和酸合聚合物 (BA-H) 的一步混合,然后进行后移植.
通过FTIR和1H-NMR确认化学结构.
使用GPC和DSC确定分子量和玻璃过渡温度.
使用三间隔厚度变异试验 (3ITT) 和接试验进行风病学表征.
剥离强度测试和显微镜分析剥离后的晶圆表面.

主要成果:

移植后的反应成功地引入了乙烯基组,使紫外线解成为可能.
粘合剂在紫外线照射后表现出高粘合强度 (15N/25毫米) 和显著降低的剥离强度 (0.5N/25毫米).
优化的配方 (0.6重%的异酸盐固化剂,10重%的PETA,30重%的C5树脂) 显示出极好的粘附性和解.
显微镜分析证实,在紫外线诱导解后,晶圆表面没有残留物.

结论:

简化后移植方法可以有效地生产高性能紫外线解烯酸粘合剂.
开发的UDAA满足了半导体行业对于强粘附和干净,无残留脱的关键要求.
该方法提供了一个多功能平台,用于为各种应用量身定制UDAA属性.

关键词:

紫外线解除粘合剂的粘合剂烯酸盐是一种烯酸盐.交叉链接是指交叉链接.在接种后的移植后.类风病学类风病学类风病学

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