作为磁道连接处屏障的AlP和GaN的潜力
Gokaran Shukla1, Hasan M Abdullah1, Udo Schwingenschlögl1
1King Abdullah University of Science and Technology (KAUST), Physical Science and Engineering Division (PSE), Thuwal 23955-6900, Saudi Arabia. gokaran.shukla@kaust.edu.sa.
Nanoscale
|September 13, 2023
概括
化 (AlP) 和化 (GaN) 在磁道结口的道屏障中表现有前途. 计算显示了Co/AlP/Co和Co/GaN/Co连接处的高道磁电阻,这表明了螺旋电子应用的潜力.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 固态化学 固态化学
背景情况:
- 宽带间隙半导体如化 (AlP) 和化 (GaN) 在光电子学中至关重要.
- 磁道连接 (MTJ) 是磁传感器和内存设备中的关键组件.
研究的目的:
- 探索AlP和GaN作为MTJ中的道屏障材料的潜力.
- 研究Co/AlP/Co和Co/GaN/Co连接的电子结构和量子传输特性.
主要方法:
- 密度函数理论 (DFT) 用于基本状态计算.
- 量子运输模拟的非平衡格林函数 (NEGF) 方法.
- 分析电子带结构和轨道贡献.
主要成果:
- 价值带边缘主要受到p轨道的影响,而导电带边缘则受到s轨道的影响.
- 无论是AlP还是GaN,都有效地过了在 Γ 点上的 Δ1 对称的布洛赫状态.
- 计算的零偏差道磁电阻 (TMR) 在Co/AlP/Co连接处达到200%,在Co/GaN/Co连接处达到300%.
结论:
- 在MTJ中,AlP和GaN具有很好的性能,可以作为道屏障.
- 观察到的高TMR值凸显了它们对先进的自旋电子设备的潜力.
- 轨道和对称过是实现高磁阻力的关键机制.
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