概括
图像格子在双朗奇剪切干扰测量中失焦,导致波面错误. 一种新的方法有效地消除了这些错误,改善了 lithography 系统的偏差测量.
科学领域:
- 光学工程是指光学工程.
- 计量学 计量学 计量学
- 石版技术 石版技术 石版技术
背景情况:
- 双朗奇剪切干扰测量对于测量高级光刻技术中波面偏差至关重要.
- 图像格子失焦是这种干扰测量技术中一个显著的系统错误.
- 缺乏对图像格子失焦的影响和减轻影响的系统研究.
研究的目的:
- 分析图像格子失焦导致的干扰场效应.
- 提出和验证一种消除这些失焦引起的错误的方法.
- 为了提高光刻投影系统中波面偏差测量的准确性.
主要方法:
- 基于标尺衍射理论的理论分析.
- 模拟了图像格子失焦的干扰场效应.
- 开发并提出了一种新的消除错误的方法.
- 进行了模拟和实验验证.
主要成果:
- 图像格子失焦主要表现为Zernike Z4和Z9条款在重建的波浪.
- Z4和Z9的系数取决于数值光圈 (NA) 和失焦距离 (z).
- 提出的方法实现了高的消除错误率:NA=0.6的99.8384%和NA=0.3.4的99.9854%.
- 对于 NA < 0.1.1,观察到几乎完全消除错误.
结论:
- 图像格子失焦是双朗奇剪切干扰测量的可量化的错误来源.
- 开发的方法有效地减轻了失焦误,大大提高了波面测量精度.
- 这项研究提供了一个关键的解决方案,用于提高高级光刻的精度.
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